Prediction of lithograpy experiments
Master projects/internships - Leuven | Just now
Predicting the outcomes of lithography experiments by conducting and optimizing simulations using specialized software.
Simulation of the process is becoming important in lithography process development. As testing every detail directly on wafers takes a lot of time, manpower and resources. Improved simulation results can guide the process development and help solve problems in a swifter and more cost-effective way.
It's important to fact that simulations are just approximations and might not perfectly match the real outcomes on wafers. Sometimes, simulations can be too optimistic or too pessimistic, which could prevent useful ideas for process development from being selected. With thorough comparison between simulation results and wafer data, the simulations can be enriched, optimized, and estimate the real situation on wafer better.
In this project, we will begin with basic simulation such as reflectivity, and then we will check more details like critical dimension (CD) and profiles.
Type of Project: Internship
Master's degree: Master of Science; Master of Engineering Science
Master program: Physics; Chemistry/Chemical Engineering; Nanoscience & Nanotechnology
Supervisor: Kristof Paredis
Supervising scientist: Wen-Hung Tseng
For more information or application, please contact Wen-Hung Tseng (wen-hung.tseng@imec.be) and Kristof Paredis (kristof.paredis@imec.be).
Only for self-supporting students.