/3D Tomographic thin Film Metrology

3D Tomographic thin Film Metrology

Brussel | Just now

Advancing precision in micro- and nano-technology through cutting-edge inspection techniques and innovative microscopy solutions

In this project, our team aims to develop alternative and cost-effective solutions to traditional microscopes by designing an advanced nano-imaging tool, particularly a Ptychographic Microscope, for defect inspection in semiconductor processes and biomedical applications. Ptychography employs innovative algorithms to reconstruct 3D surface information of target objects, enabling detailed and accurate analysis.


Our approach focuses on creating a cutting-edge tool with nano-scale resolution and low aberration across a wide field of view, making it ideal for the metrology of semiconductor thin films and biomedical samples. The primary objective is to develop a nano-imaging system by integrating enhanced hardware and software components.


The candidate will receive training to demonstrate the in-house developed Ptychographic Microscopes for inspecting a variety of samples. They will also contribute to specific topics aimed at enhancing the nano-imaging system, which may involve inspection analysis or leveraging deep-learning algorithms for data science applications.


Key responsibilities include:

Conducting microscope development

Performing image processing (MATLAB and/or Python)

Analyzing defects through advanced inspection techniques.


Successful outcomes from this work may result in journal publications, highlighting the project’s contributions to the fields of semiconductor metrology and biomedical imaging.



Type of project: Thesis, Combination of internship and thesis, Internship

Required degree: Master of Engineering Science, Master of Science, Master of Bioengineering, Master of Engineering Technology

Supervising scientist(s): For further information or for application, please contact: Hyun-su Kim (Hyun-su.Kim@imec.be)

Only for self-supporting students.

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