PhD position in Photo-assisted etching for ultralow damage etching of quantum age materials

PhD position in Photo-assisted etching for ultralow damage etching of quantum age materials

The Advanced Patterning department at imec has a fully funded open PhD position and is searching for an excellent experimentalist interested in advanced manufacturing methods of semiconductor devices and photonic sciences.  

Next generation semiconductor logic and memory devices will contain spatially structured quantum materials with atomic layer material thicknesses in the near future. This continuous miniaturization of semiconductor devices necessitates highly precise and controlled etching processes. Traditional wet-etching methods pose significant challenges including damage to these delicate structures, limited material compatibility, and environmental concerns. By deploying ultraviolet light sources, etch radicals can photoactivated in place and enhance the efficacy of the patterning and minimize the environmental impact. 

The successful candidate will work on developing tuneable ultraviolet light sources utilizing nonlinear optics and deploy these light sources to explore the etch dynamics of plasma based dry etching to address the challenges and advance the fabrication of logic and memory devices. The project will use a suite of offline and inline characterization methods commonly used in semiconductor manufacturing and state-of-the-art femtosecond time domain spectroscopy methods to ellucidate the problem.  

As such, this topic will bridge gaps by bringing together aspects of material science, CMOS processing and engineering, photonics, spectroscopy, ultrafast chemistry and physics. 

Part of the PhD program will be extended research stay at one of our partner laboratories. 

Duties and Responsibilities:  

• You hold a master's degree in physics, photonics, chemistry, engineering, nanotechnology or an international equivalent degree. Candidates nearing the completion of their master’s degree will also be considered. Your degree should be equivalent to five years of university-level study, covering both the first (BSc.) and second cycles (MSc.). 

• Candidates with prior research experience in photonics, nonlinear optics, ultrafast science, spectroscopy, photolithography or material science, are highly desirable.  

• Excellent lab skills with attention to detail and safety protocols. 

• Strong problem-solving skills, with a knack for innovative thinking. 

• Proficient in data analysis and interpretation. 

• Familiarity with scientific programming and/or hardware control using Python, Julia, C++ or MATLAB. 

• Strong proficiency in written and spoken English. 

• Ability to work both independently and collaboratively in a team-oriented manner.