2.5D Computational imaging and Patterning for Holographic Print and nano-Optical system

The demand for 2.5D and 3D micro- and nano-structures is growing rapidly across a wide range of applications, including holography, meta-lenses, and advanced display technologies. This project aims to develop innovative designs for diffraction imaging object devices by fabrication technologies to enhance holographic displays and related applications.

Our approach combines the use of conventional lithography tools with the development of an in-house patterning solution. The project focuses on achieving giga-pixel wafer designs with sub-micron resolution and enabling large-field printing for extraordinary holographic visualization. This work seeks to overcome the limitations of traditional optical solutions and pave the way for groundbreaking advancements in holography and display technologies.

Responsibilities:

• - Sample Pattern Modeling and Design 
• - Sample Fabrication and/or Optical System Development 
• - Measurement of the fabricated sample 
• - Successful work can be followed by a journal publication