SPIE Advanced Lithography + Patterning
February 23 - 27, 2025 | San Jose, California
Imec
Imec is present at SPIE Advance Lithography + Patterning 2024 with no less than 48 papers, of which 47 first-authored and 8 invited papers and 1 course. With these papers, imec present the progress made in EUV processes, masks, and metrology prepared for enabling High-NA EUV lithography. Other papers present findings on sustainable practices for advanced node lithography and etch related processes.
We also present 3 keynote presentations:
- Transformation: Climate-aware IC manufacturing - 24 February 2025 • 2:10 PM - 2:50 PM PST | Convention Center, Grand Ballroom 220A - Emily E. Gallagher
- Bioncovergence: how the intersection of biology and technology can advance human health - 24 February 2025 • 4:30 PM - 5:10 PM PST | Convention Center, Room 210A - Paru Deshpande
- 3D metrology and inspection to enable the rise of stacked transistors, wafers and chips - 24 February 2025 • 11:10 AM - 11:50 AM PST | Convention Center, Grand Ballroom 220B - Janusz Bogdanowicz
imec highlights
Keynote - Sustainable semiconductor manufacturing with a focus on lithography, by E. Gallagher, principal member of technical staff at imec.
Invited paper - Sustainable semiconductor processing solutions: status and guidelines
Paper - Where to apply sustainability optimizations in process flows?
Invited paper - Trends in e-beam metrology and inspection
Invited paper - Material and process optimization for EUV pattern rectification by directed self-assembly
Paper - E-beam metrology and defect inspection study of thin photoresist using ASML’s eP5
Paper - An experimental stitching study on the eve of high-NA EUV
Paper - Defect inspection methodology for contact holes
All imec contributions can be found here
Event Details
Each year this important community comes together to share and discuss current research, hear the latest breakthroughs, and connect with colleagues. Be sure to browse the six conferences to see which topics will be addressed and highlighted.
Why participate in Advanced Lithography + Patterning?
- The latest research: Learn from the hundreds of presentations from around the world that will be published in the SPIE Digital Library.
- Connect with colleagues: Take advantage of various technical and networking events to keep you up to date with research and peers.
- Plenary events: World-class speakers share insights on the latest challenges and opportunities from industry and academia.