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/The 31st Symposium on Photomask and NGL Mask Technology

The 31st Symposium on Photomask and NGL Mask Technology

April 16 - 18, 2025 | Yokohama, Japan

A premier international conference focused on the latest advancements in photomask and lithography-related technologies.

imec

Presentation on 'Stochastic-Aware Compact OPC Model for Reducing Failure Probability ', by Renyang Meng, R&D Engineer, April 16

Presentation on 'Fundamental Characterization of Mask with Variable Ta Thickness', Joern-Holger Franke, R&D Engineer, April 16  (Wed.) 9:10 - 11:15.

Presentation on 'Time and cost-effective methodology for curvilinear masks process qualification' - by Darko Trivkovic, Session 15 Mask Patterning 2 on April 18 (Fri.) 12:35 -13:40.

Presentation on 'Stitching at resolution for High NA: an experimental process window study', by ​​​​​​​Lieve Van Look, Researcher, ​​​​​​​April 18, 12.35h.

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Premier international conference focused on the latest advancements in photomask and lithography-related technologies. It brings together researchers, engineers, and industry professionals to discuss cutting-edge developments in mask fabrication, metrology, EUV masks, and emerging lithography techniques. The symposium features technical presentations, panel discussions, and networking opportunities, making it a key event for those in the semiconductor and photomask industry.

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